Title :
300 mm implant: pilot production at SEMICONDUCTOR300
Author :
Zeakes, J.S. ; Franke, D.W. ; Neumann, J. ; Breeden, T.
Author_Institution :
SEMICONDUCTOR300, Dresden, Germany
Abstract :
This paper presents the history, key results, and current status of two 300 mm ion implant systems used in the pilot production of 64 M DRAM at SEMICONDUCTOR300 in Dresden, Germany. Data from the Axcelis (formerly Eaton SEO) HE-3 and the Varian VIISta 80 is presented. Additional topics include 300 mm automation, maximum beam current production, throughput, and process performance
Keywords :
ion implantation; production; semiconductor device manufacture; 300 mm; 64 M DRAM; Axcelis HE-3; Eaton SEO HE-3; SEMICONDUCTOR300; Varian VIISta 80; automation; current status; history; ion implant systems; key results; maximum beam current production; pilot production; process performance; throughput; Automation; Hardware; Helium; Implants; Manufacturing; Payloads; Production; Protection; Safety; Throughput;
Conference_Titel :
Ion Implantation Technology, 2000. Conference on
Conference_Location :
Alpbach
Print_ISBN :
0-7803-6462-7
DOI :
10.1109/.2000.924162
