DocumentCode
1746640
Title
Large photosensitivity in germanosilicate planar waveguides induced by 157-nm F/sub 2/-laser radiation
Author
Chen, K.P. ; Herman, P.R. ; Jie Zhang
Author_Institution
Dept. of Electr. & Comput. Eng., Toronto Univ., Ont., Canada
Volume
3
fYear
2001
fDate
17-22 March 2001
Abstract
The photosensitivity response of germanium-doped planar silica waveguides was characterized with 157-nm F/sub 2/ laser radiation. A small penetration depth of several microns provided refractive index changes above 10/sup -3/ with /spl sim/10-kJ/cm/sup 2/ total fluence.
Keywords
germanium compounds; laser beam effects; optical glass; optical planar waveguides; refractive index; sensitivity; silicon compounds; 157 nm; F/sub 2/; F/sub 2/-laser radiation; SiO/sub 2/-GeO/sub 2/; SiO/sub 2/:Ge; germanium-doped planar silica waveguides; germanosilicate planar waveguides; penetration depth; photosensitivity; photosensitivity response; refractive index changes; total fluence; Fiber lasers; Glass; Hydrogen; Optical films; Optical planar waveguides; Optical refraction; Optical waveguides; Planar waveguides; Refractive index; Waveguide lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical Fiber Communication Conference and Exhibit, 2001. OFC 2001
Conference_Location
Anaheim, CA, USA
Print_ISBN
1-55752-655-9
Type
conf
Filename
928531
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