Dynamic calibration of low range silicon pressure sensors

Author

Zakrzewski, J. ; Wróbel, K.

Author_Institution

Silesian Univ. of Technol., Gliwice, Poland

Volume

1

fYear

2001

fDate

21-23 May 2001

Firstpage

493

Abstract

Two methods of dynamic calibration of the low pressure piezoresistive sensors are presented and related to each other. The first method consists in the generation of the standing waves in a tube of the length corresponding to the wave frequency. The change of the wave frequency allows to obtain step by step the whole frequency response of the sensor. The second method consists in the recording of the down-step time response of the sensor. The main difficulty of the method lies in obtaining the proper shape of the pressure drop. It has been found out that the inlet tube length is essential in obtaining the successful results. Comparison of the both methods shows the satisfactory agreement of the calibration results

Keywords

calibration; elemental semiconductors; frequency response; microsensors; piezoresistive devices; pressure sensors; silicon; Helmholtz resonator; Si; down-step time response; dynamic calibration; frequency response; inlet tube length; low pressure piezoresistive sensors; low range silicon pressure sensors; micromechanical sensors; pressure drop shape; standing waves generation; wave frequency change; Calibration; Capacitive sensors; Electric shock; Frequency response; Piezoresistance; Pressure measurement; Pulse shaping methods; Resonant frequency; Shape; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Instrumentation and Measurement Technology Conference, 2001. IMTC 2001. Proceedings of the 18th IEEE

Conference_Location

Budapest

ISSN

1091-5281

Print_ISBN

0-7803-6646-8

Type

conf

DOI

10.1109/IMTC.2001.928868

Filename

928868