Title :
Exciton localization dynamics due to shallow and deep isoelectric traps in a triple GaAs quantum well grown by growth-interrupted molecular beam epitaxy
Author :
Matsuo, M. ; Sasayama, K. ; Nogami, T. ; Satoh, K. ; Fujiwara, K.
Author_Institution :
Kyushu Inst. of Technol., Kitakyushu, Japan
Abstract :
We have investigated the exciton localization dynamics in a triple GaAs quantum well (QW) system which consists of different well thicknesses separated by thick Al0.17Ga0.83As barriers, prepared by growth-interrupted molecular beam epitaxy. Due to the formation of atomically-flat QW growth islands, sharply split exciton emission lines corresponding to the monolayer terraces are clearly observed in low temperature photoluminescence (PL) spectra, and they exhibit a variety of interesting recombination dynamics which reflect exciton transfer between the different terraces (shallow traps) as well as between the different QW´s (deep traps). Based on steady-state and time-resolved PL measurements, experimental evidence is given to show that the three electronically isolated QW´s are interacting and competing to capture photoexcited carriers, and their dynamics strongly varies as a function of lattice temperature
Keywords :
III-V semiconductors; aluminium compounds; deep levels; electron traps; excitons; gallium arsenide; interface states; island structure; photoluminescence; semiconductor quantum wells; Al0.17Ga0.83As-GaAs; PL spectra; atomically-flat QW growth islands; deep isoelectric traps; deep traps; exciton localization dynamics; exciton transfer; growth-interrupted molecular beam epitaxy; lattice temperature; low temperature photoluminescence; monolayer terraces; photoexcited carriers; recombination dynamics; shallow isoelectric traps; shallow traps; split exciton emission lines; steady-state PL; terraces; thick Al0.17Ga0.83As barriers; time-resolved PL; triple GaAs quantum well; well thickness; Atomic layer deposition; Electron traps; Excitons; Gallium arsenide; Molecular beam epitaxial growth; Photoluminescence; Radiative recombination; Spontaneous emission; Steady-state; Temperature;
Conference_Titel :
Semiconducting and Insulating Materials Conference, 2000. SIMC-XI. International
Conference_Location :
Canberra, ACT
Print_ISBN :
0-7803-5814-7
DOI :
10.1109/SIM.2000.939236