DocumentCode :
1749301
Title :
How hot is cold emission?
Author :
Busta, Heinz H.
Author_Institution :
Sarnoff Corp., Princeton, NJ, USA
fYear :
2001
fDate :
2001
Firstpage :
93
Lastpage :
94
Abstract :
The temperature rise of nanocrystalline graphite coated silicon substrates and of gated p+ - silicon field emitter arrays fabricated on silicon was measured as a function of emission current. In both cases, the temperature rise is proportionate to I2, indicating Joule´s heating. The temperature rise was calibrated using a substrate of similar size onto which a micromachined point heat source was fabricated. From these measurements, a spreading resistance can be deduced which is responsible for the I2 heating. From the spreading resistance, a radius of the emission sites of run dimensions is obtained. This estimate agrees with Fowler-Nordheim analysis. For a 6460 silicon tip array, at a total emission current of 100 μA, the tip temperature is about 100°C
Keywords :
electron field emission; elemental semiconductors; graphite; nanostructured materials; silicon; vacuum microelectronics; 100 degC; 100 muA; C; Fowler-Nordheim analysis; Si; cold emission; emission current; micromachined point heat source; nanocrystalline graphite coated Si substrates; spreading resistance; tip temperature; total emission current; Anodes; Current measurement; Electrical resistance measurement; Electron emission; Field emitter arrays; Quantum mechanics; Resistance heating; Semiconductor device measurement; Silicon; Temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
Conference_Location :
Davis, CA
Print_ISBN :
0-7803-7197-6
Type :
conf
DOI :
10.1109/IVMC.2001.939669
Filename :
939669
Link To Document :
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