Title :
Chemical-solution processing and patterning of integrated ferroelectrics
Author :
Mikalsen, E.A. ; Payne, D.A. ; Clem, P.G.
Author_Institution :
Dept. of Mater. Sci. & Eng., Illinois Univ., Urbana, IL, USA
Abstract :
In this paper we report the chemical-solution processing of dense insulating ferroelectric thin layers with emphasis on the patterning of device structures. A review is presented for a wide range of patterning techniques and details are reported for new additive methods that appear suited for ferroelectric applications
Keywords :
ferroelectric devices; ferroelectric thin films; chemical-solution processing; dense insulating layers; device structures; ferroelectric thin films; integrated ferroelectrics; patterning techniques; Chemical processes; Ferroelectric materials; Insulation; Laboratories; Lead compounds; Optical materials; Polarization; Residual stresses; Substrates; Thermal stresses;
Conference_Titel :
Applications of Ferroelectrics, 2000. ISAF 2000. Proceedings of the 2000 12th IEEE International Symposium on
Conference_Location :
Honolulu, HI
Print_ISBN :
0-7803-5940-2
DOI :
10.1109/ISAF.2000.941502
