DocumentCode :
1749995
Title :
Retention and imprint properties in single-crystalline PLZT thin film capacitors
Author :
Kurasawa, M. ; Kurihara, K. ; Otani, S. ; Kutami, M.
Author_Institution :
Fujitsu Labs. Ltd., Atsugi, Japan
Volume :
1
fYear :
2000
fDate :
2000
Firstpage :
173
Abstract :
Retention and imprint properties were investigated in single-crystalline PLZT thin film capacitors. The capacitors showed an excellent retention property and an asymmetric voltage shift in P-V hysteresis loop depending on poling direction. These imply that the retention is attributed to the bulk thin film quality and the imprint is dominantly affected by the interface effect. In current-voltage measurements for initial and imprinted capacitors, the space charge distribution change was observed at the interface. The charge accumulation is considered to associate with the imprint failure
Keywords :
dielectric hysteresis; dielectric polarisation; ferroelectric capacitors; ferroelectric storage; lanthanum compounds; lead compounds; random-access storage; space charge; thin film capacitors; P-V hysteresis loop; PLZT; PbLaZrO3TiO3; X-ray diffraction; asymmetric voltage shift; bulk thin film quality; charge accumulation; current-voltage measurements; ferroelectric random access memory capacitors; imprint failure; imprint properties; interface effect; ionized acceptors; poling direction; polycrystalline thin film; positive ionized donors; reliability; retention property; single-crystalline thin film; single-crystalline thin film capacitors; space charge distribution change; Capacitors; Hysteresis; Polarization; Pulse measurements; Random access memory; Substrates; Testing; Transistors; Voltage; X-ray diffraction;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Applications of Ferroelectrics, 2000. ISAF 2000. Proceedings of the 2000 12th IEEE International Symposium on
Conference_Location :
Honolulu, HI
ISSN :
1099-4734
Print_ISBN :
0-7803-5940-2
Type :
conf
DOI :
10.1109/ISAF.2000.941535
Filename :
941535
Link To Document :
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