Title :
AFM polarization studies of high-fatigue-endurance PZT thin film capacitors with modified Pt/RuO2 top electrodes
Author :
Colla, E.L. ; Stolichnov, I. ; Tagantsev, A.K. ; Setter, N.
Author_Institution :
Dept. of Mater., Swiss Fed. Inst. of Technol., Lausanne, Switzerland
Abstract :
It has been recently shown that low leakage conduction and very good polarization fatigue performance with PZT ferroelectric thin films and Pt electrodes can be achieved by suitably adding a very thin layer of conductive oxide between the PZT and the top Pt-electrode. The particular dependence of the fatigue effect on the electric field is consistent with the earlier proposed scenario where the switching polarization suppression is determined by the relative properties of the top (TE) and bottom (BE) electrode interfaces and by the possibility of having or not, bipolar nucleation at both interfaces. In the present work it is attempted, by means of local polarization detection assisted by atomic force microscopy (AFM), to directly observe how the fatigued states are influenced by the presence of a RuO2 thin layer between the Pt-TE and the PZT. The objective is to verify the validity of the above mentioned fatigue scenario based on the inhibition of domain nucleation, induced by electric charge injection in the near interface region of the ferroelectric film and to analyze the piezoelectric signal amplitude as a function of fatigue. The long-term objective is to disclose the microscopic fatigue mechanism
Keywords :
atomic force microscopy; dielectric polarisation; ferroelectric capacitors; ferroelectric storage; ferroelectric switching; ferroelectric thin films; lead compounds; thin film capacitors; PZT; PbZrO3TiO3; Pt-RuO2; atomic force microscopy; charge compensation; domain nucleation; electric charge injection; ferroelectric film; high-fatigue-endurance thin film capacitors; local polarization detection; microscopic fatigue mechanism; modified top electrodes; near interface region; polarization fatigue performance; switching polarization suppression; Atomic force microscopy; Atomic layer deposition; Conductive films; Electrodes; Fatigue; Ferroelectric films; Ferroelectric materials; Optical polarization; Tellurium; Transistors;
Conference_Titel :
Applications of Ferroelectrics, 2000. ISAF 2000. Proceedings of the 2000 12th IEEE International Symposium on
Conference_Location :
Honolulu, HI
Print_ISBN :
0-7803-5940-2
DOI :
10.1109/ISAF.2000.941536