Title :
Simulations of electric potential and field profiles in Si microstrip detectors with various strip widths/pitch configurations: introduction of guard strip concept for better field distribution
Author_Institution :
Brookhaven Nat. Lab., Upton, NY, USA
Abstract :
Two-dimensional simulations of the electrical properties of Si microstrip detectors various strip width/pitch configurations have been systematically performed using a processing and device simulation tool. It has been found that the detector full depletion voltage (Vfd ) depends greatly on the ratios of strip width (W) to pitch (P) and pitch to detector thickness (d). The value of Vfd increases with the decreasing ratio of W/P: Vfd for W/P=0.1 (P=100 m) is almost twice of that of a bulk detector (W/P=1) for different bulk resistivities (simulation of before and after radiation). The increasing rate of Vfd with decreasing W/P is much higher when W/P<9.3. It has also been found that, for a given strip width, the strip pitch should be kept smaller than the sum of detector thickness and strip width, i.e. P<d+W or P<d (if W<<d). Otherwise the value of Vfd will be affected significantly (much larger than that of a bulk detector). It is clearly shown through the simulation that this increase of Vfd is due to the lateral depletion from the strip edge. A new width/pitch configuration with guard strips is proposed, which has shown a great promise to push the W/P ratio down to 0.1 without greatly affecting the detector full depletion voltage
Keywords :
electric potential; position sensitive particle detectors; silicon radiation detectors; Si; Si microstrip detectors; bulk resistivities; detector full depletion voltage; electric potential; field distribution; field profiles; guard strip concept; strip pitch; strip widths; Conductivity; Degradation; Electric potential; Large Hadron Collider; Microstrip; Radiation detectors; Silicon radiation detectors; Sputtering; Strips; Voltage;
Conference_Titel :
Nuclear Science Symposium Conference Record, 2000 IEEE
Conference_Location :
Lyon
Print_ISBN :
0-7803-6503-8
DOI :
10.1109/NSSMIC.2000.949006