Title :
Evaluation of Si(Li) detectors by a combination of the copper staining method and X-ray analytical microscopy
Author :
Kume, Hideyuki ; Onabe, Hideaki ; Obinata, Mitsugu ; Kashiwagi, Toshisuke
Author_Institution :
Div. of Environ. Chem., Nat. Inst. of Environ. Studies, Ibaraki, Japan
Abstract :
We performed copper mapping for copper-stained lithium ion compensated, Si(Li), wafers by micro-beam X-ray fluorescence (μ-XRF) method. Positional distribution of copper across a cross section of the wafers treated at 120 C for 20 hours with no bias applied after complete compensation clearly showed deviation from those not given the thermal treatment. It was also found that surface barrier detectors fabricated from the so treated wafers exhibited better energy resolutions for both conversion electrons from 207Bi and particles from 241 Am. Correlation between performance of the Si(Li) detectors and lithium distribution in the intrinsic region was studied on the basis of the experimental results
Keywords :
X-ray detection; X-ray fluorescence analysis; X-ray microscopy; copper; heat treatment; position sensitive particle detectors; silicon radiation detectors; 120 C; 20 h; 207Bi; 241Am; Cu; Cu staining method; Si(Li) detectors; Si:Li; X-ray analytical microscopy; conversion electrons; micro-beam X-ray fluorescence; positional distribution; surface barrier detectors; thermal treatment; Atomic layer deposition; Copper; Electrons; Fluorescence; Lithium; Silicon; Surface treatment; X-ray detection; X-ray detectors; X-ray imaging;
Conference_Titel :
Nuclear Science Symposium Conference Record, 2000 IEEE
Conference_Location :
Lyon
Print_ISBN :
0-7803-6503-8
DOI :
10.1109/NSSMIC.2000.949026
