Title :
Characterisation of Slow Light in a Waveguide Grating
Author :
De Ridder, René M. ; Hopman, Wico C L ; Hoekstra, Hugo J W M
Author_Institution :
Inst. for Nanotechnol., Twente Univ., Enschede
Abstract :
A grating was defined in a silicon nitride waveguide, using a combination of both conventional lithography and laser interference lithography. The structure was optically characterized in the 1520-1560 nm wavelength range by combining transmission measurements with the analysis of local out-of-plane scattered light, using a high-resolution infrared camera. From the measured power enhancement of the first Bloch-mode resonance above the long-wavelength band edge we estimated a Q >104 and a group velocity of <0.1 c
Keywords :
Q-factor; diffraction gratings; integrated optics; light scattering; optical waveguides; photolithography; silicon compounds; 1520 to 1560 nm; Q-factor; Si3N4; conventional lithography; first Bloch-mode resonance; high-resolution camera; infrared camera; laser interference lithography; local out-of-plane scattered light; long-wavelength band edge; silicon nitride waveguide; slow light; transmission measurements; waveguide grating; Gratings; Interference; Lithography; Optical scattering; Optical waveguides; Resonance light scattering; Silicon; Slow light; Waveguide lasers; Wavelength measurement; Q-factor; photonic crystal; resonance; slow light measurement; waveguide grating;
Conference_Titel :
Transparent Optical Networks, 2006 International Conference on
Conference_Location :
Nottingham
Print_ISBN :
1-4244-0235-2
Electronic_ISBN :
1-4244-0236-0
DOI :
10.1109/ICTON.2006.248344
