• DocumentCode
    1753958
  • Title

    Optimized design of control plans based on risk exposure and resources capabilities

  • Author

    Bettayeb, Belgacem ; Vialletelle, Philippe ; Bassetto, Samuel ; Tollenaere, Michel

  • Author_Institution
    Grenoble Univ., Grenoble, France
  • fYear
    2010
  • fDate
    18-20 Oct. 2010
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    In this paper, we present a coherent method for Quality Control planning that tackles the limitations of traditional approaches when applied to an advanced high-mix medium volume 300 mm fab. The proposed approach consists of two stages and takes into account both the risk exposure, expressed in terms of quantity of products potentially lost, and resources capabilities (process and measurement tools).
  • Keywords
    integrated circuit manufacture; process design; quality control; risk management; control plans; measurement tools; optimized design; process tools; quality control planning; resources capabilities; risk exposure; Artificial neural networks; Monitoring; Optimization; Production;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing (ISSM), 2010 International Symposium on
  • Conference_Location
    Tokyo
  • ISSN
    1523-553X
  • Print_ISBN
    978-1-4577-0392-8
  • Electronic_ISBN
    1523-553X
  • Type

    conf

  • Filename
    5750227
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1753958