Title :
Optimized design of control plans based on risk exposure and resources capabilities
Author :
Bettayeb, Belgacem ; Vialletelle, Philippe ; Bassetto, Samuel ; Tollenaere, Michel
Author_Institution :
Grenoble Univ., Grenoble, France
Abstract :
In this paper, we present a coherent method for Quality Control planning that tackles the limitations of traditional approaches when applied to an advanced high-mix medium volume 300 mm fab. The proposed approach consists of two stages and takes into account both the risk exposure, expressed in terms of quantity of products potentially lost, and resources capabilities (process and measurement tools).
Keywords :
integrated circuit manufacture; process design; quality control; risk management; control plans; measurement tools; optimized design; process tools; quality control planning; resources capabilities; risk exposure; Artificial neural networks; Monitoring; Optimization; Production;
Conference_Titel :
Semiconductor Manufacturing (ISSM), 2010 International Symposium on
Conference_Location :
Tokyo
Print_ISBN :
978-1-4577-0392-8
Electronic_ISBN :
1523-553X
