Title :
Application and effect verification of EES to old generation resist coater
Author :
Shimojoh, Takahiro ; Shimbo, Masahiro
Author_Institution :
SANYO Semicond. Manuf. Co., Ltd., Ojiya, Japan
Abstract :
In this paper, we discussed the possibility of application of EES (Equipment Engineering System) to old generation resist coater. We also showed the effectiveness of arranging log data to “Basic EE Data” proposed in Selete. We confirmed that the application of EES was effective not only in the latest equipment but also old generation one, and that “Basic EE Data” was able to reduce time and cost of the data analysis.
Keywords :
cost reduction; data analysis; formal verification; EES verification; basic EE data; data analysis; equipment engineering system; old generation resist coater;
Conference_Titel :
Semiconductor Manufacturing (ISSM), 2010 International Symposium on
Conference_Location :
Tokyo
Print_ISBN :
978-1-4577-0392-8
Electronic_ISBN :
1523-553X
