DocumentCode :
1753974
Title :
Effective start up study and factor analysis for lithography process filter
Author :
Umeda, Toru ; Tsuzuki, Shuichi ; Numaguchi, Toru
Author_Institution :
Nihon Pall Ltd., Ami, Japan
fYear :
2010
fDate :
18-20 Oct. 2010
Firstpage :
1
Lastpage :
4
Abstract :
In order to drive reduced chemical consumption, effective tool operation, effective utilization of next-generation filtration products, and environmental benefits, greater demands will be placed on the development of effective start up procedures for point-of-use filters in advanced lithography resist coating processes. The current study evaluates the effectiveness of two procedural methods, static pressure driven fluid delivery and fluid deaeration, on filter start up improvement. Further, factor analysis revealed inlet pressure to have a significant impact on filter start up quality.
Keywords :
coatings; filtration; lithography; advanced lithography resist coating processes; chemical consumption; environmental benefits; factor analysis; fluid deaeration; lithography process filter; next-generation filtration products; point-of-use filters; start up procedures; static pressure driven fluid delivery; Fluids; Regulators; Transducers; Valves;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing (ISSM), 2010 International Symposium on
Conference_Location :
Tokyo
ISSN :
1523-553X
Print_ISBN :
978-1-4577-0392-8
Electronic_ISBN :
1523-553X
Type :
conf
Filename :
5750243
Link To Document :
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