DocumentCode
1753991
Title
Potential technologies for next generation defect inspection
Author
Patel, Dilip ; Hamaguchi, Akira ; Arceo, Abraham
fYear
2010
fDate
18-20 Oct. 2010
Firstpage
1
Lastpage
5
Abstract
Potential technologies for next generation defect inspection is reported. These include intentional defect array test structures(IDA), rapid probe microscope(RPM) which produces nanoscale imaging, and spatial heterodyne interferometry.
Keywords
electron beam applications; flaw detection; heterodyne detection; light interferometry; nanophotonics; optical arrays; optical fabrication; optical microscopes; e-beam writing; intentional defect array test structures; molecular imprint; nanoscale imaging; rapid probe microscope; spatial heterodyne interferometry; Arrays; Films; Industries; Inspection; Laser noise; Metrology; Next generation networking;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing (ISSM), 2010 International Symposium on
Conference_Location
Tokyo
ISSN
1523-553X
Print_ISBN
978-1-4577-0392-8
Electronic_ISBN
1523-553X
Type
conf
Filename
5750261
Link To Document