Title :
Potential technologies for next generation defect inspection
Author :
Patel, Dilip ; Hamaguchi, Akira ; Arceo, Abraham
Abstract :
Potential technologies for next generation defect inspection is reported. These include intentional defect array test structures(IDA), rapid probe microscope(RPM) which produces nanoscale imaging, and spatial heterodyne interferometry.
Keywords :
electron beam applications; flaw detection; heterodyne detection; light interferometry; nanophotonics; optical arrays; optical fabrication; optical microscopes; e-beam writing; intentional defect array test structures; molecular imprint; nanoscale imaging; rapid probe microscope; spatial heterodyne interferometry; Arrays; Films; Industries; Inspection; Laser noise; Metrology; Next generation networking;
Conference_Titel :
Semiconductor Manufacturing (ISSM), 2010 International Symposium on
Conference_Location :
Tokyo
Print_ISBN :
978-1-4577-0392-8
Electronic_ISBN :
1523-553X
