DocumentCode :
1754207
Title :
A block-parallel signal processing system for CMOS image sensor with three-dimensional structure
Author :
Kiyoyama, K. ; Lee, K.-W. ; Fukushima, T. ; Naganuma, H. ; Kobayashi, H. ; Tanaka, T. ; Koyanagi, M.
Author_Institution :
Dept. of Electr. & Electron. Eng., Nagasaki Inst. of Appl. Sci., Nagasaki, Japan
fYear :
2010
fDate :
16-18 Nov. 2010
Firstpage :
1
Lastpage :
4
Abstract :
In this paper, we describe the fundamental study of the block-parallel analog signal processing elements which includes CMOS image sensor, correlated double sampling (CDS) array, and analog-to-digital converter (ADC) array. To realize high-speed image capturing sensor, we have proposed a blockparallel signal processing with three-dimensional (3-D) structure. In proposed system, one block consists of 3 stacked layers which are 100 pixels image sensor, CDS circuit, and one ADC. Each circuit layer is vertically stacked and electrically connected by through-Si vias (TSVs), which can improve sensor performance. On the other hand, the block-parallel system requires ADC with extremely low-power and small circuit area, ADC is required. Therefore, the trade-off among area, power dissipation and conversion speed is important factor, and critical challenge. ADC designed in the test chip for functional evaluation employed the time interleaved charge-redistribution successive approximation (SAR) method. The proposed 9-bit ADC was designed in 90-nm CMOS technology, and achieved power dissipation less than 0.5mW with supply voltage of 1.0V and 4 MS/s conversion rate. The circuit area is 100 ×100 μm2.
Keywords :
CMOS image sensors; analogue-digital conversion; three-dimensional integrated circuits; 3 stacked layer; ADC array; CDS array; CDS circuit; CMOS image sensor; CMOS technology; SAR method; TSV; analog-to-digital converter; block-parallel analog signal processing system; charge-redistribution successive approximation method; correlated double sampling array; power dissipation; size 90 nm; three-dimensional structure; through-Si vias; voltage 1.0 V; Arrays; CMOS image sensors; CMOS integrated circuits; Image processing; Pixel; Through-silicon vias;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
3D Systems Integration Conference (3DIC), 2010 IEEE International
Conference_Location :
Munich
Print_ISBN :
978-1-4577-0526-7
Type :
conf
DOI :
10.1109/3DIC.2010.5751479
Filename :
5751479
Link To Document :
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