Title :
An INSPECT Measurement System for Moving Objects
Author :
Fuqin Deng ; Chang Liu ; Wuifung Sze ; Jiangwen Deng ; Fung, Kenneth S. M. ; Lam, Edmund Y.
Author_Institution :
Dept. of Electr. & Electron. EngineeringImaging Syst. Lab., Univ. of Hong Kong, Hong Kong, China
Abstract :
Noncontact optical imaging is frequently used in the inspection and metrology of stationary objects, including in particular the reconstruction of the 3-D surface profile. A technique, known as phase-measuring profilometry, involves projecting a sinusoidal pattern and then inferring the height of various points on the object by measuring the resulting phase changes at the respective locations. However, this method cannot be directly applied to systems involving moving objects, as the translation and the perspective geometry effect manifest as errors in the height calculations. In this paper, we report on an imaging and numerical surface profilometry with error compensation technology (INSPECT) measurement system that is tailored for moving objects. We model the imaging system that considers the nonlinear perspective geometry effect, and simplify to a first-order equation using Taylor series expansion. With this, we generalize the conventional phase shift algorithm, and develop the optimization procedures that can compute the height information effectively. We apply this technology to the INSPECT measurement system in semiconductor manufacturing and show significant improvement in accuracy and robustness.
Keywords :
error compensation; geometry; imaging; measurement errors; numerical analysis; optimisation; series (mathematics); surface topography measurement; 3D surface profile reconstruction; INSPECT measurement system; Taylor series expansion; first-order equation; height calculation error; height information computation; imaging and numerical surface profilometry with error compensation technology; inspection; moving object measurement; noncontact optical imaging; nonlinear perspective geometry effect; optimization procedure; phase measurement; phase shift algorithm; phase-measuring profilometry; semiconductor manufacturing; sinusoidal pattern projection; stationary object metrology; translation geometry effect; Gratings; Image reconstruction; Imaging; Inspection; Metrology; Semiconductor device measurement; Surface reconstruction; 3-D image acquisition; fringe pattern analysis; fringe pattern profilometry; image reconstruction; industrial inspection; surface measurement; surface measurement.;
Journal_Title :
Instrumentation and Measurement, IEEE Transactions on
DOI :
10.1109/TIM.2014.2329387