Title :
Structural Order and Staebler–Wronski Effect in Hydrogenated Amorphous Silicon Films and Solar Cells
Author :
Kohler, Fabian ; Zimmermann, Thomas ; Muthmann, Stefan ; Gordijn, A. ; Carius, Reinhard
Author_Institution :
Forschungszentrum Julich GmbH, Julich, Germany
Abstract :
The structure of hydrogenated amorphous silicon films is investigated by Raman spectroscopy and X-ray diffraction. Raman spectroscopy probes the phonon density of states, whereas X-ray diffraction measures the distribution of the electron density. Yet, both methods can yield information on the microstructure of the material represented by certain parameters like, e.g., the position or the width of the transverse optical phonon or the width of the first scattering peak. Interdependences between these parameters are investigated and evaluated. A correlation was found between the structural disorder and the relative efficiency loss caused by the Staebler-Wronski effect for intrinsic films applied as absorbing layers in solar cells. This correlation could be used to estimate the solar cell degradation without time-consuming light-soaking experiments.
Keywords :
Raman spectra; Staebler-Wronski effect; X-ray diffraction; amorphous semiconductors; crystal microstructure; electron density; elemental semiconductors; hydrogen; phonons; semiconductor thin films; silicon; solar cells; Raman spectroscopy; Si:H; Staebler-Wronski effect; X-ray diffraction; XRD; absorbing layers; electron density distribution; hydrogenated amorphous silicon film structure; material microstructure; phonon density of states; relative efficiency loss; scattering peak width; solar cell degradation; structural disorder; transverse optical phonon width position; Amorphous silicon; Correlation; Degradation; Phonons; Photovoltaic cells; Raman scattering; Amorphous semiconductors; Raman scattering; X-ray diffraction; degradation; microstructure; photovoltaic cells; silicon;
Journal_Title :
Photovoltaics, IEEE Journal of
DOI :
10.1109/JPHOTOV.2013.2287911