DocumentCode
1756579
Title
Holographic Printing of Three-Dimensional Photonics Structures: A very large-scale integration approach.
Author
Di Xu ; Poole, Zolst ; Yuankun Lin ; Chen, Kevin P.
Volume
8
Issue
3
fYear
2014
fDate
Sept. 2014
Firstpage
4
Lastpage
13
Abstract
This article describes the transformational changes that have occurred in the last few years in the field of laser holographic lithography. As the nanotechnology industry demands a scalable manufacturing solution for 3-D nanostructures and devices, researchers around the world are answering the call. The persistent efforts and ingenuities of scientists and engineers have transformed laser holographic lithography into a one-optical-element and one-laser-exposure process that is amendable into the existing VLSI fabrication scheme. Leveraged by advances in other fields of optics technology such as adaptive optics, the laser holographic lithography will continue to evolve into a simple, robust, flexible, and scalable manufacturing tool for sophisticated 3-D nanostructures and devices.
Keywords
VLSI; adaptive optics; holography; nanofabrication; photolithography; three-dimensional printing; 3D nanostructures; VLSI fabrication; adaptive optics; holographic printing; laser holographic lithography; nanotechnology industry; one-laser-exposure process; one-optical-element process; three-dimensional photonics structures; very large-scale integration approach; Holographic optical components; Holography; Interference; Laser beams; Lithography; Optical device fabrication; Optical imaging;
fLanguage
English
Journal_Title
Nanotechnology Magazine, IEEE
Publisher
ieee
ISSN
1932-4510
Type
jour
DOI
10.1109/MNANO.2014.2326968
Filename
6853317
Link To Document