Title :
Holographic Printing of Three-Dimensional Photonics Structures: A very large-scale integration approach.
Author :
Di Xu ; Poole, Zolst ; Yuankun Lin ; Chen, Kevin P.
Abstract :
This article describes the transformational changes that have occurred in the last few years in the field of laser holographic lithography. As the nanotechnology industry demands a scalable manufacturing solution for 3-D nanostructures and devices, researchers around the world are answering the call. The persistent efforts and ingenuities of scientists and engineers have transformed laser holographic lithography into a one-optical-element and one-laser-exposure process that is amendable into the existing VLSI fabrication scheme. Leveraged by advances in other fields of optics technology such as adaptive optics, the laser holographic lithography will continue to evolve into a simple, robust, flexible, and scalable manufacturing tool for sophisticated 3-D nanostructures and devices.
Keywords :
VLSI; adaptive optics; holography; nanofabrication; photolithography; three-dimensional printing; 3D nanostructures; VLSI fabrication; adaptive optics; holographic printing; laser holographic lithography; nanotechnology industry; one-laser-exposure process; one-optical-element process; three-dimensional photonics structures; very large-scale integration approach; Holographic optical components; Holography; Interference; Laser beams; Lithography; Optical device fabrication; Optical imaging;
Journal_Title :
Nanotechnology Magazine, IEEE
DOI :
10.1109/MNANO.2014.2326968