• DocumentCode
    1756579
  • Title

    Holographic Printing of Three-Dimensional Photonics Structures: A very large-scale integration approach.

  • Author

    Di Xu ; Poole, Zolst ; Yuankun Lin ; Chen, Kevin P.

  • Volume
    8
  • Issue
    3
  • fYear
    2014
  • fDate
    Sept. 2014
  • Firstpage
    4
  • Lastpage
    13
  • Abstract
    This article describes the transformational changes that have occurred in the last few years in the field of laser holographic lithography. As the nanotechnology industry demands a scalable manufacturing solution for 3-D nanostructures and devices, researchers around the world are answering the call. The persistent efforts and ingenuities of scientists and engineers have transformed laser holographic lithography into a one-optical-element and one-laser-exposure process that is amendable into the existing VLSI fabrication scheme. Leveraged by advances in other fields of optics technology such as adaptive optics, the laser holographic lithography will continue to evolve into a simple, robust, flexible, and scalable manufacturing tool for sophisticated 3-D nanostructures and devices.
  • Keywords
    VLSI; adaptive optics; holography; nanofabrication; photolithography; three-dimensional printing; 3D nanostructures; VLSI fabrication; adaptive optics; holographic printing; laser holographic lithography; nanotechnology industry; one-laser-exposure process; one-optical-element process; three-dimensional photonics structures; very large-scale integration approach; Holographic optical components; Holography; Interference; Laser beams; Lithography; Optical device fabrication; Optical imaging;
  • fLanguage
    English
  • Journal_Title
    Nanotechnology Magazine, IEEE
  • Publisher
    ieee
  • ISSN
    1932-4510
  • Type

    jour

  • DOI
    10.1109/MNANO.2014.2326968
  • Filename
    6853317