DocumentCode :
1756896
Title :
Range Extension of a Bimorph Varifocal Micromirror Through Actuation by a Peltier Element
Author :
Paterson, Alan ; Bauer, Ralf ; Li Li ; Lubeigt, Walter ; Uttamchandani, Deepak
Author_Institution :
Dept. of Electron. & Electr. Eng., Univ. of Strathclyde, Glasgow, UK
Volume :
21
Issue :
4
fYear :
2015
fDate :
July-Aug. 2015
Firstpage :
72
Lastpage :
78
Abstract :
A bimorph varifocal micromirror actuated thermoelectrically by a Peltier element is reported. The single-crystal silicon micromirror is 1.2 mm in diameter with a centered 1-mm-diameter gold coating for broadband reflection. The actuation principle is capable of varying the micromirror temperature above and below the ambient temperature, which contributed to a 57% improvement in the addressable curvature range in comparison to previously reported electrothermal and optothermal actuation techniques for the device. Altering the device temperature from 10 °C to 100 °C provided a mirror surface radius of curvature variation from 19.2 to 30.9 mm, respectively. The experimental characterization of the micromirror was used as a basis for accurate finite-element modeling of the device and its actuation. Negligible optical aberrations are observed over the operating range, enabling effectively aberration-free imaging. Demonstration in an optical imaging system illustrated sharp imaging of objects over a focal plane variation of 212 mm.
Keywords :
aberrations; elemental semiconductors; finite element analysis; focal planes; micromirrors; optical images; silicon; thermoelectric devices; Peltier element; Si; aberration-free imaging; actuation; bimorph varifocal micromirror; broadband reflection; electrothermal actuation; finite element modeling; focal plane; optical aberrations; optical imaging system; optothermal actuation; radius 19.2 mm to 30.9 mm; range extension; sharp imaging; single-crystal silicon micromirror; size 1.2 mm; temperature 10 degC to 100 degC; Crystals; Gold; Imaging; Micromirrors; Silicon; Stress; Temperature measurement; Optical MEMS; Silicon-on-insulator multi-user MEMS processes (SOIMUMPs; Varifocal micromirror (VFM); finite element analysis; imaging; optical MEMS; silicon-on-insulator multi-user MEMS processes (SOIMUMPs); thermal actuation;
fLanguage :
English
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
1077-260X
Type :
jour
DOI :
10.1109/JSTQE.2014.2381464
Filename :
6985566
Link To Document :
بازگشت