DocumentCode
1758395
Title
Cathode Plasma Integral Spectroscopy Diagnosis on High Current Pulsed Electron Beam Diode
Author
Yao Weibo ; Zhang Yongmin ; Tang Junping ; Guo Jianming ; Cheng Liang
Author_Institution
State Key Lab. of Intense Pulsed Radiat. Simulation & Effect, Xi´an, China
Volume
42
Issue
10
fYear
2014
fDate
Oct. 2014
Firstpage
3264
Lastpage
3267
Abstract
Cathode plasma is an important factor affecting the cathode emission on high current pulsed electron beam diode. Diagnosing the cathode plasma composition by integral spectrum system is a method for studying the cathode plasma formation and development process. The aim of this paper is to study the cathode plasma composition and analyze the cathode plasma formation mechanism by integral spectroscopic diagnosis of different materials and cathode pretreatments. Experiment results show that not only cathode material itself, but also impurity material and adsorptive gas on cathode surface are found in the cathode plasma. For the same material, the cathode plasma composition remains unchanged, whereas the characteristic line intensity decreases as the experiment times increase. The composition of the cathode plasma can be controlled by adulterated treatment.
Keywords
plasma diagnostics; plasma diodes; plasma impurities; plasma sources; spectral line intensity; adsorptive gas; cathode emission; cathode plasma composition; cathode plasma formation mechanism; cathode plasma integral spectroscopy diagnosis; cathode pretreatments; characteristic line intensity; high current pulsed electron beam diode; impurity material; Cathodes; Copper; Electron beams; Graphite; Materials; Plasmas; Surface treatment; Cathode plasma; electron beam; high current diode; integral spectroscopy; integral spectroscopy.;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2014.2305653
Filename
6855325
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