DocumentCode :
1758687
Title :
Strip Detectors Processed on High-Resistivity 6-inch Diameter Magnetic Czochralski Silicon (MCz-Si) Substrates
Author :
Wu, Xiaojie ; Harkonen, J. ; Kalliopuska, J. ; Tuominen, E. ; Maenpaa, T. ; Luukka, Pasi ; Tuovinen, E. ; Karadzhinova, A. ; Spiegel, Laurie ; Eranen, S. ; Oja, A. ; Haapalinna, A.
Author_Institution :
VTT Tech. Res. Center of Finland, Espoo, Finland
Volume :
61
Issue :
1
fYear :
2014
fDate :
Feb. 2014
Firstpage :
611
Lastpage :
618
Abstract :
Tracking detectors for future high-luminosity particle physics experiments have to be simultaneously radiation hard and cost efficient. This paper describes processing and characterization of p+ /n-/n+ (n-type silicon bulk) detectors made of high-resistivity Magnetic Czochralski silicon (MCz-Si) substrates with 6-inch wafer diameter. The processing was carried out on a line used for large-scale production of sensors using standard fabrication methods, such as implanting polysilicon resistors to bias individual sensor strips. Special care was taken to avoid the creation of Thermal Donors (TD) during processing. The sensors have a full depletion voltage of 120-150 V which are uniform over the investigated sensors. All of the leakage current densities were below 55 nA/cm2 at 200 V bias voltage. A strip sensor with 768 channels was attached to readout electronics and tested in particle beam with a data acquisition (DAQ) similar to the system used by the CMS experiment at the CERN LHC. The test beam results show a signal-to-noise ratio greater than 40 for the test beam sensor. The results demonstrate that MCz-Si detectors can reliably be manufactured in the industrial scale semiconductor process.
Keywords :
current density; data acquisition; leakage currents; nuclear electronics; readout electronics; resistors; silicon radiation detectors; CERN LHC; CMS experiment; MCz-Si detectors; Si; data acquisition; full depletion voltage; future high-luminosity particle physics experiments; high-resistivity Magnetic Czochralski silicon substrates; industrial scale semiconductor process; large-scale sensor production; leakage current densities; n-type silicon bulk detectors; p+/n-/n+ detectors; particle beam; polysilicon resistors; radiation hard; readout electronics; signal-to-noise ratio; size 6 inch; standard fabrication methods; strip detectors; strip sensor; test beam sensor; thermal donors; tracking detectors; voltage 120 V to 150 V; voltage 200 V; wafer diameter; Current measurement; Detectors; Semiconductor device measurement; Silicon; Strips; Voltage measurement; High energy physics; radiation hardness; silicon radiation sensors; strip detector;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2013.2295430
Filename :
6733408
Link To Document :
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