DocumentCode :
1759972
Title :
Highly integrated CMOS RF SPDT switch with ESD and unit cell optimisation in MCM
Author :
Chen, A.Y.-K.
Author_Institution :
Skyworks Solutions, Newbury Park, CA, USA
Volume :
49
Issue :
8
fYear :
2013
fDate :
April 11 2013
Firstpage :
549
Lastpage :
551
Abstract :
Presented is the performance of a highly integrated RF single-pole double-throw (SPDT) switch fabricated in a 0.18 μm bulk CMOS process and housed in a low-cost laminated multi-chip module (MCM-L) package. A switch controller is also implemented and consumes ~40 μA from a 3.4 V supply. The switch, based upon the 1.8 V thin-oxide devices with resistive body-floating and unit cell layout optimisation techniques, achieves an insertion loss of 0.52/0.78 dB at 0.9/2.45 GHz, respectively. TX-to-RX isolation of > 29 dB and return loss of > 15 dB are achieved at these frequencies. The measured IP1dB of 21.7/21.2 dBm and IIP3 of 38.3/37.4 dBm are accomplished at 0.9/2.45 GHz, respectively. Finally, the switch achieves a RF electrostatic discharge (ESD) rating of 4 kV for the ± 2 kV human body model and 500 V for the ± 200 V machine model.
Keywords :
CMOS integrated circuits; UHF integrated circuits; circuit optimisation; electrostatic discharge; field effect transistor switches; integrated circuit layout; multichip modules; ESD; MCM-L package; TX-to-RX isolation; electrostatic discharge rating; frequency 0.9 GHz; frequency 2.45 GHz; highly integrated CMOS RF SPDT switch; highly integrated RF single-pole double-throw switch fabrication; human body model; insertion loss; laminated multichip module package; machine model; resistive body-floating technique; return loss; size 0.18 mum; switch controller; thin oxide devices; unit cell layout optimisation technique; voltage 1.8 V; voltage 3.4 V; voltage 4 kV; voltage 500 V;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el.2012.3387
Filename :
6527553
Link To Document :
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