DocumentCode
1760124
Title
Degradation of Polycrystalline Silicon TFT CMOS Inverters under AC Operation
Author
Chen, Wei ; Wang, Mingxiang ; Zhou, Yan ; Wong, Man
Author_Institution
Dept. of Microelectron., Soochow Univ., Suzhou, China
Volume
60
Issue
1
fYear
2013
fDate
Jan. 2013
Firstpage
295
Lastpage
300
Abstract
Degradation of polycrystalline silicon (poly-Si) thin-film transistor (TFT)-based CMOS inverters under AC operation is studied. Based on a previous drain current model of poly-Si TFTs including the kink effect, the voltage transfer characteristics of both fresh and stressed inverters are well described. It is determined that hot carrier of the n-TFT and negative bias temperature instability of the p-TFT are competing degradation mechanisms controlling the observed two-stage degradation of the inverter. Based on such mechanisms, degradation of inverter under various AC operation conditions can be qualitatively predicted. It is found that under given frequency and amplitude of the input pulse voltage, inverter´s degradation can still be effectively suppressed by increasing the pulse falling time, and/or decreasing the low voltage duration.
Keywords
CMOS integrated circuits; elemental semiconductors; negative bias temperature instability; silicon; thin film transistors; AC operation; Si; TFT CMOS inverter; drain current model; hot carrier; kink effect; n-TFT; negative bias temperature instability; p-TFT; poly-Si thin-film transistor; polycrystalline silicon; pulse voltage; voltage transfer characteristic; CMOS integrated circuits; Degradation; Inverters; Silicon; Stress; Temperature measurement; Thin film transistors; hot carrier (HC); inverter; negative bias temperature instability (NBTI); polycrystalline silicon (poly-Si); voltage transfer characteristics (VTC);
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2012.2228865
Filename
6384729
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