Permanent Phase Correction in a Polarization Diversity Si PIC by Femtosecond Laser Pulses

We report a fast and efficient method for permanently correcting fabrication-induced phase errors in silicon photonic circuits. The method uses femtosecond laser pulses at 400-nm wavelength to amorphize a thin layer of crystalline silicon near the waveguide surface, thereby inducing a change in the effective index of the waveguide. Using a single femtosecond laser pulse, we reduced the polarization-dependent frequency shift between the two interferometers of a polarization diversity differential phase shift keying silicon demodulator from 11 GHz to less than 0.5 GHz, thereby restoring the polarization diversity operation of the circuit with little degradation to the circuit performance.