• DocumentCode
    1760354
  • Title

    Compact Zero-Temperature Coefficient Modeling Approach for MOSFETs Based on Unified Regional Modeling of Surface Potential

  • Author

    Siau Ben Chiah ; Xing Zhou ; Li Yuan

  • Author_Institution
    Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore
  • Volume
    60
  • Issue
    7
  • fYear
    2013
  • fDate
    41456
  • Firstpage
    2164
  • Lastpage
    2170
  • Abstract
    A compact zero-temperature coefficient (ZTC) modeling approach is demonstrated for generic MOSFETs. Instead of manually extracting ZTC points through C-V or I-V data over a range of operating temperatures, the ZTC model marks the cross-over ZTC points by Newton-Raphson solutions to the ZTC voltages based on the compact charge/current models. It calculates the ZTC voltages in the accumulation (Vztc,sa) and depletion (Vztc,ds) regions based on the unified regional modeling of surface potential for the gate capacitance at zero drain bias (Vds=0). It is extended to the ZTC voltage (Vztc,ds) for gate capacitance in the depletion and saturation regions at any Vds, and the ZTC voltage (Vztc) for drain current in the linear and saturation regions at any Vds. The proposed approach can be adopted to create a process window with constant ZTC contours for different process parameters, such as body doping and gate-oxide thickness at any drain biases. The process windows provide useful information in determining the optimum process parameters and operating voltages for circuit design in ruggedized electronics that operate at high-temperature conditions.
  • Keywords
    MOSFET; Newton-Raphson method; doping; integrated circuit design; semiconductor device models; surface potential; MOSFET; Newton-Raphson solutions; ZTC modeling; ZTC points; body doping; charge-current models; circuit design; compact zero-temperature coefficient; drain current; gate capacitance; gate-oxide thickness; process window; ruggedized electronics; surface potential; unified regional modeling; zero drain bias; Compact modeling; MOSFET; Q-point design; process window; ruggedized electronics; surface potential; unified regional modeling (URM); zero-temperature coefficient (ZTC);
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2013.2262713
  • Filename
    6527897