DocumentCode
1760989
Title
An Analytic Model for Heterojunction Tunnel FETs With Exponential Barrier
Author
Taur, Yuan ; Jianzhi Wu ; Jie Min
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of California at San Diego, La Jolla, CA, USA
Volume
62
Issue
5
fYear
2015
fDate
42125
Firstpage
1399
Lastpage
1404
Abstract
This paper presents an analytic model for double-gate tunnel FETs with an exponential barrier. By carrying out the Wentzel-Kramer-Brillouin integral in closed form, an I-V model is formulated in terms of a single integral of a continuous function with respect to energy. The model shows that source degeneracy helps the linear region Ids-Vds characteristics, but degrades the saturation current. Also investigated is the role of the effective density of states on the debiasing of Vgs due to channel inversion charge at low Vds. A high effective density of states is shown to lead to superlinear Ids-Vds characteristics.
Keywords
WKB calculations; field effect transistors; tunnel transistors; I-V model; Wentzel-Kramer-Brillouin integral; channel inversion charge; double-gate tunnel FET; exponential barrier; field effect transistor; heterojunction tunnel FET; saturation current; source degeneracy; Analytical models; Heterojunctions; Indium gallium arsenide; MOSFET; Mathematical model; Tunneling; Band-to-band tunneling; heterojunction; tunnel FET (TFET); tunnel FET (TFET).;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2015.2407695
Filename
7057667
Link To Document