• DocumentCode
    1760989
  • Title

    An Analytic Model for Heterojunction Tunnel FETs With Exponential Barrier

  • Author

    Taur, Yuan ; Jianzhi Wu ; Jie Min

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of California at San Diego, La Jolla, CA, USA
  • Volume
    62
  • Issue
    5
  • fYear
    2015
  • fDate
    42125
  • Firstpage
    1399
  • Lastpage
    1404
  • Abstract
    This paper presents an analytic model for double-gate tunnel FETs with an exponential barrier. By carrying out the Wentzel-Kramer-Brillouin integral in closed form, an I-V model is formulated in terms of a single integral of a continuous function with respect to energy. The model shows that source degeneracy helps the linear region Ids-Vds characteristics, but degrades the saturation current. Also investigated is the role of the effective density of states on the debiasing of Vgs due to channel inversion charge at low Vds. A high effective density of states is shown to lead to superlinear Ids-Vds characteristics.
  • Keywords
    WKB calculations; field effect transistors; tunnel transistors; I-V model; Wentzel-Kramer-Brillouin integral; channel inversion charge; double-gate tunnel FET; exponential barrier; field effect transistor; heterojunction tunnel FET; saturation current; source degeneracy; Analytical models; Heterojunctions; Indium gallium arsenide; MOSFET; Mathematical model; Tunneling; Band-to-band tunneling; heterojunction; tunnel FET (TFET); tunnel FET (TFET).;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2015.2407695
  • Filename
    7057667