DocumentCode :
1761842
Title :
Plasma Low-Pressure Nonsteady Diffusion Fluid Model for Pulsed Plasma Recovery
Author :
Yi Li ; Bocong Zheng ; Lei, M.K.
Author_Institution :
Surface Eng. Lab., Dalian Univ. of Technol., Dalian, China
Volume :
41
Issue :
1
fYear :
2013
fDate :
Jan. 2013
Firstpage :
43
Lastpage :
48
Abstract :
In order to describe the diffusion behavior of low-pressure plasma, the low-pressure nonsteady diffusion fluid model is built using the equations of ion continuity and ion motion, Boltzmann´s relationship of the electron, and variable mobility of the ion. The plasma recovery process in pulsed plasma is described by this model from the viewpoint of diffusion, which is the basic physical mechanism causing recovery. The fluid model is verified to be accurate compared with the particle-in-cell method. The characteristics of multipulse sheath dynamics are studied using this model for inner surface modification of a tube by the plasma-based ion implantation (PBII). Compared with the no-diffusion case, the sheath expansion during pulse-on time is accelerated, and the sheath is thicker when considering the plasma diffusion. During pulse-off time, the plasma recovery behavior of the ion-depleted region is obtained. For a shorter pulse-off time, the plasma cannot recover to its initial state. The maximum of the ion-implantation current can be strongly decreased due to the incomplete plasma recovery, but the average ion-implantation current is improved and achieves its maximum when the duty cycle is 0.8. All these results can provide beneficial theoretical guidance for the parameter optimization in the PBII.
Keywords :
Boltzmann equation; plasma immersion ion implantation; plasma pressure; plasma sheaths; plasma transport processes; Boltzmann relationship; duty cycle; electron mobility; ion continuity; ion motion; ion-depleted region; ion-implantation current; multipulse sheath dynamics; physical mechanism; plasma low-pressure nonsteady diffusion fluid model; plasma-based ion implantation; pulse-on time; pulsed plasma recovery; sheath expansion; surface modification; Electron tubes; Mathematical model; Plasma density; Plasma sources; Steady-state; Surface treatment; Fluid model; plasma diffusion; plasma recovery; plasma-based ion implantation (PBII);
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2012.2231704
Filename :
6387316
Link To Document :
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