Title :
Breakthroughs in Photonics 2013: X-Ray Optics
Author_Institution :
Lawrence Livermore Nat. Lab., Livermore, CA, USA
Abstract :
This review discusses the latest advances in extreme ultraviolet/X-ray optics development, which are motivated by the availability and demands of new X-ray sources and scientific and industrial applications. Among the breakthroughs highlighted are the following: i) fabrication, metrology, and mounting technologies for large-area optical substrates with improved figure, roughness, and focusing properties; ii) multilayer coatings with especially optimized layer properties, achieving improved reflectance, stability, and out-of-band suppression; and iii) nanodiffractive optics with improved efficiency and resolution.
Keywords :
X-ray optics; antireflection coatings; optical fabrication; optical multilayers; X-ray optics; X-ray sources; extreme ultraviolet optics; fabrication; figure; focusing properties; large-area optical substrates; metrology; mounting technologies; multilayer coatings; nanodiffractive optics; out-of-band suppression; photonics; reflectance; roughness; stability; Adaptive optics; Mirrors; Nonhomogeneous media; Optical device fabrication; Ultraviolet sources; EUV; X-ray applications; X-ray optics; metrology; multilayer interference coatings;
Journal_Title :
Photonics Journal, IEEE
DOI :
10.1109/JPHOT.2014.2309640
