DocumentCode :
1763563
Title :
HAPL: Heterogeneous Array of Programmable Logic Using Selective Mask Patterning
Author :
Youngsoo Shin ; Insup Shin ; Donkyu Baek ; Duckhwan Kim ; Seungwhun Paik
Author_Institution :
Dept. of Electr. Eng., Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea
Volume :
61
Issue :
1
fYear :
2014
fDate :
Jan. 2014
Firstpage :
146
Lastpage :
159
Abstract :
A structured ASIC, one kind of programmable logic device (PLD), consists of a homogeneous array of programmable logic elements, or called tiles. The architecture of each tile is supposed to be very general so that any kind of logic can be implemented on it; this is the main reason why a structured ASIC has an inherently limited performance, together with a large area requirement compared to an ASIC. This balances the little mask cost of structured ASIC. We tilt this balance by introducing a small number of different types of tile, each with its own architecture, which can be deployed across different designs by the use of a simple blocking mask. This is made possible by a new photolithography concept called selectively patterned masks (SPM), which we propose. We address the practical issues of SPM, including mask cost and manufacturing time. We introduce the heterogeneous array of programmable logic (HAPL), which is a new structured ASIC which takes advantage of SPM. HAPL has its own tile and routing architectures, and supporting CAD tools for packing and routing. Extensive experiments in 45-nm technology are used to assess HAPL and compare it with ASIC. A HAPL design that is optimized for area is about twice the size of its ASIC counterpart. A delay-optimized HAPL design exhibits a post-layout delay which is, on average, 1.35 that of an equivalent ASIC.
Keywords :
application specific integrated circuits; logic design; masks; photolithography; programmable logic arrays; CAD tools; PLD; SPM; blocking mask; delay-optimized HAPL design; heterogeneous array of programmable logic; photolithography; programmable logic device; selectively patterned masks; size 45 nm; structured ASIC; tiles; ASIC; Programmable logic; mask; photolithography; structured ASIC;
fLanguage :
English
Journal_Title :
Circuits and Systems I: Regular Papers, IEEE Transactions on
Publisher :
ieee
ISSN :
1549-8328
Type :
jour
DOI :
10.1109/TCSI.2013.2264690
Filename :
6529196
Link To Document :
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