DocumentCode :
1763565
Title :
On the Performance of Lateral SiGe Heterojunction Bipolar Transistors With Partially Depleted Base
Author :
Raman, Srikumar ; Sharma, Prachi ; Neogi, Tuhin Guha ; LeRoy, Mitchell R. ; Clarke, Ryan ; McDonald, John F.
Author_Institution :
Center for Integrated Electron., Rensselaer Polytech. Inst., Troy, NY, USA
Volume :
62
Issue :
8
fYear :
2015
fDate :
Aug. 2015
Firstpage :
2377
Lastpage :
2383
Abstract :
This paper discusses improvements to a lateral bipolar device capable of integration into the existing CMOS process flow. With the help of simulations, we demonstrate that the emitter transit time limits the cutoff frequency of a lateral bipolar device. We show that with the introduction of a heterojunction and a partially depleted base, we can decrease the emitter transit time and increase the current gain and the cutoff frequency (ft) of the device. For a balanced design, our simulations indicate an n-p-n device with an ft of 812 GHz and an fmax of 1.08 THz; and a p-n-p device with an ft of 635 GHz and an fmax of 1.15 THz. The collector current at cutoff frequency for both n-p-n and p-n-p devices is ~0.03 mA-roughly 100 times lower than commercial vertical heterojunction bipolar transistors.
Keywords :
CMOS integrated circuits; Ge-Si alloys; heterojunction bipolar transistors; CMOS process flow; SiGe; cutoff frequency; emitter transit time limits; frequency 1.08 THz; frequency 1.15 THz; frequency 635 GHz; frequency 812 GHz; lateral bipolar device; lateral heterojunction bipolar transistors; n-p-n device; p-n-p device; Cutoff frequency; Doping; Mathematical model; Semiconductor process modeling; Silicon germanium; Thermal resistance; Bipolar transistors; Silicon on Insulator (SOI) devices; Silicon on Insulator (SOI) devices.; heterojunction bipolar transistors (HBTs);
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2015.2438819
Filename :
7123593
Link To Document :
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