Title :
AlGaN-Based Lateral Current Injection Laser Diodes Using Regrown Ohmic Contacts
Author :
Satter, Md Mahbub ; Lochner, Zachary ; Jae-Hyun Ryou ; Shyh-Chiang Shen ; Dupuis, Russell ; Yoder, P.D.
Author_Institution :
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
Abstract :
A lateral current injection (LCI) design for AlGaN deep-ultraviolet edge-emitting laser diodes (LDs) on AlN substrates is presented. Two-dimensional optoelectronic simulation predicts lasing at a wavelength of 290 nm. Unlike vertical current injection designs, LCI designs can take advantage of narrow-bandgap p-type contact layers with minimal impact on the optical confinement factor through a partial decoupling of the problems of optical confinement and electrical injection. With polarization-charge-matched quantum well barriers, a large number of quantum wells can be used in LCI designs, which not only enhances the optical confinement factor but also distributes joule heating over a large volume. This is the first theoretical investigation of an LCI LD design in the III-V nitride material system.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; narrow band gap semiconductors; ohmic contacts; quantum well lasers; AlGaN; AlN; III-V nitride material; LCI; deep-ultraviolet edge-emitting laser diodes; lateral current injection laser diodes; narrow-bandgap p-type contact layers; ohmic contacts; optical confinement factor; polarization-charge-matched quantum well barriers; two-dimensional optoelectronic simulation; wavelength 290 nm; Aluminum gallium nitride; Lasers; Materials; Optical polarization; Optical reflection; Optical refraction; Optical variables control; AlGaN active layer; AlN substrate; deep ultraviolet laser diodes; lateral current injection; polarization charge; quaternary barrier; regrown ohmic contacts;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2012.2235826