Title :
Failure Analysis of Asymmetric Aging Under NBTI
Author :
Velamala, J.B. ; Sutaria, Ketul B. ; Ravi, V.S. ; Yu Cao
Author_Institution :
Sch. of Electr., Comput. & Energy Eng., Arizona State Univ., Tempe, AZ, USA
Abstract :
With CMOS technology scaling, design for reliability has become an important step in the design cycle and increased the need for efficient and accurate aging simulation methods during the design stage. NBTI-induced delay shifts in logic paths are asymmetric in nature, as opposed to the averaging effect due to recovery assumed in traditional aging analysis. Timing violations due to aging, in particular, are very sensitive to the standby operation regime of a digital circuit. In this paper, by identifying the critical moments in circuit operation and considering the asymmetric aging effects, timing violations under NBTI effect are correctly predicted. The unique contributions of this work include the following: 1) Accurate modeling of aging-induced gate delay shift due to transistor threshold voltage (Vth) shift, using only the delay dependence on supply voltage from cell library, is presented; 2) an efficient simulation flow for asymmetric aging analysis is proposed and conducted at critical points in circuit operation; and 3) timing violations due to NBTI aging are investigated in sequential circuits and the proposed framework is tested in VLSI applications such as DDR memory and SRAM caches. This methodology is comprehensively demonstrated with ISCAS89 benchmark circuits using a 45-nm Nangate standard cell library characterized using predictive technology models. Our proposed failure assessment provides design insights and enables resilient techniques for mitigating digital circuit aging.
Keywords :
CMOS logic circuits; VLSI; failure analysis; logic gates; logic testing; negative bias temperature instability; sequential circuits; CMOS technology scaling; DDR memory; ISCAS89 benchmark circuit; NBTI-induced delay shift; SRAM cache; VLSI application; aging simulation method; aging-induced gate delay shift; asymmetric aging analysis; asymmetric aging effect; design for reliability; digital circuit aging mitigation; failure analysis; logic path; nangate standard cell library; predictive technology model; sequential circuit; simulation flow; size 45 nm; timing violations; Aging; Degradation; Delay; Integrated circuit modeling; Logic gates; Stress; Asymmetric aging; design for reliability; negative bias temperature instability; static timing analysis (STA);
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
DOI :
10.1109/TDMR.2012.2235441