DocumentCode :
1765202
Title :
Low-Voltage Double-Gate ZnO Thin-Film Transistor Circuits
Author :
Li, Yuanyuan V. ; Ramirez, J. Israel ; Sun, Kaige G. ; Jackson, Thomas N.
Author_Institution :
Dept. of Electr. Eng., Penn State Univ., University Park, PA, USA
Volume :
34
Issue :
7
fYear :
2013
fDate :
41456
Firstpage :
891
Lastpage :
893
Abstract :
In this letter, we report double-gate ZnO thin-film transistor (TFT) circuits deposited by plasma-enhanced atomic layer deposition that are suitable for low-voltage operation. Compared to bottom-gate-only ZnO TFTs, double-gate ZnO TFTs have improved mobility, subthreshold slope, and bias stability. In this letter, the TFT top gate is used to adjust the bottom-gate turn-on and threshold voltage. This allows the logic transition point for circuits to be adjusted for operation at a low voltage. Using this approach, high-gain inverters (gain >100) and low-voltage ring oscillators using double-gate TFTs have been demonstrated. Double-gate inverters with a beta ratio of 5 have a gain larger than 100. Fifteen-stage double-gate ZnO TFT ring oscillators operate with VDD = 1.5 V, ID = 28 μA, and propagation delay of 2 μs per stage.
Keywords :
II-VI semiconductors; atomic layer deposition; carrier mobility; invertors; low-power electronics; oscillators; plasma CVD; thin film transistors; wide band gap semiconductors; zinc compounds; TFT top gate; ZnO; beta ratio; bias stability; bottom-gate turn-on; bottom-gate-only TFT; current 28 muA; double-gate TFT circuits; double-gate inverters; fifteen-stage double-gate TFT ring oscillators; high-gain inverters; logic transition point; low-voltage double-gate thin-film transistor circuits; low-voltage operation; low-voltage ring oscillators; mobility; plasma-enhanced atomic layer deposition; propagation delay; subthreshold slope; threshold voltage; voltage 1.5 V; Double gate; ZnO; low-power operated circuits; plasma-enhanced atomic layer deposition; thin-film transistors (TFTs);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2013.2263193
Filename :
6530657
Link To Document :
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