DocumentCode :
1765498
Title :
Method of Fabrication for Encapsulated Polarizing Resonant Gratings
Author :
Pung, Aaron J. ; Carl, Scott R. ; Srimathi, Indumathi Raghu ; Johnson, Eric G.
Author_Institution :
Holcombe Dept. of Electr. & Comput. Eng., Clemson Univ., Clemson, SC, USA
Volume :
25
Issue :
15
fYear :
2013
fDate :
Aug.1, 2013
Firstpage :
1432
Lastpage :
1434
Abstract :
In this letter, we present a novel method of fabricating encapsulated resonant gratings. The fabrication method uses selective etching, conformal deposition, conventional lithography, and direct bonding techniques. Our letter includes simulation and experimental results, confirming a strong resonance unique to the TE polarization at 1550 nm with a 5 nm full-width at half-maximum.
Keywords :
bonding processes; diffraction gratings; encapsulation; etching; light polarisation; optical fabrication; photolithography; TE polarization; conformal deposition; conventional lithography; direct bonding techniques; encapsulated polarizing resonant gratings; full-width at half-maximum; resonance; selective etching; wavelength 1550 nm; Resonant gratings; optical components; optical waveguide filters;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2013.2266575
Filename :
6530695
Link To Document :
بازگشت