DocumentCode :
1765628
Title :
Impacts of Multiple Strain-Gate Engineering on a Zero-Temperature-Coefficient Point
Author :
Chang, Tian-Sheuan ; Lu, Tsung Yi ; Chao, Tien-Sheng
Author_Institution :
National Chiao Tung University, Hsinchu, Taiwan
Volume :
34
Issue :
4
fYear :
2013
fDate :
41365
Firstpage :
481
Lastpage :
483
Abstract :
The impacts of zero-temperature-coefficient (ZTC) points of various strained devices is presented in this paper. The current and mobility are reduced at high temperature by phonon scattering. The degree of mobility reduction becomes severe on devices with multiple strain-gate engineering. The reduction of mobility becomes severe as a result of impurity scattering, which results from gate implantation impurities. The ZTC point is decreased by multiple strain-gate engineering due to the decreased V th.
Keywords :
Mobility; nMOSFETs; strain; temperature; zero-temperature-coefficient (ZTC) point;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2013.2247736
Filename :
6484132
Link To Document :
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