• DocumentCode
    1766184
  • Title

    On the Initialization of Threaded Run-to-Run Control of Semiconductor Manufacturing

  • Author

    Harirchi, Farshad ; Vincent, Tyrone L. ; Subramanian, Ananth ; Poolla, K. ; Stirton, Broc

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., Colorado Sch. of Mines, Golden, CO, USA
  • Volume
    27
  • Issue
    4
  • fYear
    2014
  • fDate
    Nov. 2014
  • Firstpage
    515
  • Lastpage
    522
  • Abstract
    Run-to-run control is a major tool used in semiconductor manufacturing to keep the unit processes within the required manufacturing constraints. Typically, the difference or bias between the desired and actual result of processing a particular wafer is affected by not only the particular product being produced, but also the prior processing path. Each unique combination of effects is called a thread, and in threaded run-to-run control a separate exponentially weighted moving average controller is applied for each thread. One of the challenges of threaded control is the initialization of the bias estimate for a new thread. Automated initialization methods prevent the cost of manual initialization or utilizing a pilot run, but at the risk of producing outliers in the initialized runs. On the other hand, the manual initialization or using pilot runs incur an extra expense. In this paper, we study a new approach for initialization of the threads by combining the threaded and nonthreaded control strategies. This method avoids the cost associated with manual initialization methods and improves the efficiency of automated methods. Finally, the simulation results will demonstrate the efficiency of the proposed method in comparison with other techniques.
  • Keywords
    process control; semiconductor industry; automated initialization methods; manufacturing constraints; moving average controller; processing path; semiconductor manufacturing; threaded run-to-run control; unit processes; Hierarchical systems; Kalman filters; Metrology; Process control; Simulation; Estimation; kalman filters; least squares approximations; lithography; process control; semiconductor process modeling;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/TSM.2014.2362539
  • Filename
    6919309