DocumentCode :
1766327
Title :
The Cause of Subthreshold Leakage Currents Induced by Nucleons and Ions in Power MOSFETs
Author :
Chugg, Andrew M. ; Parker, Stefan ; Duncan, P.H. ; Barber, Thomas S. ; Hands, A. ; Morris, Phil ; Poivey, C.
Author_Institution :
Radiat. Effects Group, MBDA U.K. Ltd., Bristol, UK
Volume :
60
Issue :
4
fYear :
2013
fDate :
Aug. 2013
Firstpage :
2530
Lastpage :
2536
Abstract :
Additional evidence is presented and discussed on the mechanism for the subthreshold leakage currents induced in power MOSFETs by single nucleon and ion interactions. The new evidence excludes microdose in gate oxides and instead points to microdose in field/edge oxides.
Keywords :
dosimetry; leakage currents; power MOSFET; radiation effects; field-edge oxides; gate oxides; microdosimetry; nucleon-ion interaction; power MOSFET; subthreshold leakage current; Logic gates; MOSFET; Neutrons; Radiation effects; Sensitivity; Threshold voltage; Microdosimetry; neutrons; semiconductor device radiation effects; single event effects; total dose;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2013.2246870
Filename :
6484203
Link To Document :
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