• DocumentCode
    1766741
  • Title

    Lateral and Vertical Transistors Using the AlGaN/GaN Heterostructure

  • Author

    Chowdhury, Shuvro ; Mishra, Umesh K.

  • Author_Institution
    Sch. of Electr., Comput. & Energy Eng., Arizona State Univ., Tempe, AZ, USA
  • Volume
    60
  • Issue
    10
  • fYear
    2013
  • fDate
    Oct. 2013
  • Firstpage
    3060
  • Lastpage
    3066
  • Abstract
    Power conversion losses are endemic in all areas of electricity consumption, including motion control, lighting, air conditioning, and information technology. Si, the workhorse of the industry, has reached its material limits. Increasingly, the lateral AlGaN/GaN HEMT based on gallium nitride (GaN-on-Si) is becoming the device of choice for medium power electronics as it enables high-power conversion efficiency and reduced form factor at attractive pricing for wide market penetration. The reduced form factor enabled by high-efficiency operation at high frequency further enables significant system price reduction because of savings in bulky extensive passive elements and heat sink costs. The high-power market, however, still remains unaddressed by lateral GaN devices. The current and voltage demand for high power conversion application makes the chip area in a lateral topology so large that it becomes more difficult to manufacture. Vertical GaN devices would play a big role alongside of silicon carbide (SiC) to address the high power conversion needs. In this paper, the development, performance, and status of lateral and vertical GaN devices are discussed.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; power conversion; silicon compounds; wide band gap semiconductors; AlGaN-GaN; HEMT; SiC; air conditioning; bulky extensive passive elements; electricity consumption; heat sink costs; high-power conversion efficiency; information technology; lateral transistor devices; lighting; medium power electronics; motion control; power conversion losses; reduced form factor; system price reduction; vertical transistor devices; Aluminum gallium nitride; Apertures; Gallium nitride; HEMTs; Logic gates; Silicon; Gallium nitride (GaN); lateral transistors; vertical transistors;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2013.2277893
  • Filename
    6587757