Title :
Improved microwave noise performance in 0.15µm AlGaN/AlN/GaN HEMTs on Silicon
Author :
Ng, G.I. ; Arulkumaran, S. ; Ranjan, K. ; Vicknesh, S.
Author_Institution :
Sch. of EEE, Nanyang Technol. Univ., Singapore, Singapore
Abstract :
High-frequency microwave noise performances (2 GHz to 19 GHz) were investigated on AlGaN/AlN/GaN High Electron Mobility Transistors (HEMTs) with 0.15 μm T-gate fabricated on high resistivity 4-inch Silicon. The HEMTs exhibited maximum drain current density (IDmax) of 830 mA/mm, maximum extrinsic transconductance (gmmax) of 353 mS/mm, unity current cut-off frequency (fT) of 65 GHz and maximum oscillation frequency (fmax) of 125 GHz. At VDS=6V and ID=188mA/mm, the devices exhibited a minimum noise figure (NFmin) of 0.59 dB at 10 GHz and 1.5 dB at 18 GHz. The NFmin for 10 GHz is the lowest reported value in the literatures for conventional AlGaN/GaN HEMTs on Si substrate. No significant change in microwave noise performance has been observed in the devices over for a wide range of ID (22 mA/mm to 500mA/mm) and VD (3V to 16V).
Keywords :
high electron mobility transistors; microwave field effect transistors; AlGaN-AlN-GaN; HEMT; frequency 2 GHz to 19 GHz; high electron mobility transistor; high-frequency microwave noise performance; noise figure 0.59 dB; noise figure 1.5 dB; size 0.15 mum; size 4 in; voltage 3 V to 16 V; Aluminum gallium nitride; Gallium nitride; HEMTs; MODFETs; Noise; Silicon; Substrates; AlGaN/GaN; HEMTs; Microwave Noise; gate-leakage current; short channel effects;
Conference_Titel :
Microwave Conference (EuMC), 2014 44th European
Conference_Location :
Rome
DOI :
10.1109/EuMC.2014.6986703