DocumentCode :
1768900
Title :
ESD protection design for wideband RF applications in 65-nm CMOS process
Author :
Li-Wei Chu ; Chun-Yu Lin ; Ming-Dou Ker ; Ming-Hsiang Song ; Jen-Chou Tseng ; Chewn-Pu Jou ; Ming-Hsien Tsai
Author_Institution :
Taiwan Semicond. Manuf. Co., Hsinchu, Taiwan
fYear :
2014
fDate :
1-5 June 2014
Firstpage :
1480
Lastpage :
1483
Abstract :
All wireless communication products must meet the reliability specifications during mass production. To prevent from electrostatic discharge (ESD) damages, the ESD protection designs must be added at all input/output pads in chip. Some ESD protection designs with low parasitic capacitance for radio-frequency (RF) applications are reviewed in this paper. Besides, a novel ESD protection design is proposed and realized in a 65nm CMOS process to protect the wideband RF circuits. In this work, diodes are used for ESD protection and inductors are used for high-frequency performance fine tuning. Experimental results of the test circuits have been successfully verified.
Keywords :
CMOS integrated circuits; electrostatic discharge; integrated circuit design; integrated circuit reliability; radiofrequency integrated circuits; CMOS process; ESD protection design; diodes; electrostatic discharge; high-frequency performance fine tuning; inductors; input-output pads; low parasitic capacitance; mass production; radio-frequency applications; reliability specifications; size 65 nm; wideband RF circuits; wireless communication products; CMOS integrated circuits; Electrostatic discharges; Inductors; Parasitic capacitance; Radio frequency; Robustness; Wideband; Diode; ESD; T-coil; radio-frequency (RF); wideband;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Circuits and Systems (ISCAS), 2014 IEEE International Symposium on
Conference_Location :
Melbourne VIC
Print_ISBN :
978-1-4799-3431-7
Type :
conf
DOI :
10.1109/ISCAS.2014.6865426
Filename :
6865426
Link To Document :
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