DocumentCode
1769686
Title
Plasmon excitation of coherent interface phonons in Si-SiO2 systems
Author
Choi, M.S. ; Nanzhu Zhang ; Dutta, Maitreyee ; Stroscio, Michael A. ; Aspetti, Carlos O. ; Agarwal, Rohit
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Illinois at Chicago, Chicago, IL, USA
fYear
2014
fDate
3-6 June 2014
Firstpage
1
Lastpage
3
Abstract
Coherent interface phonon generation by surface plasmon in silver-SiO2-silicon system is analyzed, based on the impulsive stimulated scattering theory model. The surface plasmon is first analyzed, and applied to semiclassical stimulated Raman scattering theory. Our calculatation shows that the photon-induced surface plasmons store about 20-30% of the total incoming energy, and it is considered in the analysis. Phonon potential of the generated phonons is also calculated.
Keywords
interface phonons; silicon; silicon compounds; silver; surface plasmons; Ag; Ag-Si-SiO2; Si-SiO2; coherent interface phonons; impulsive stimulated scattering theory model; phonon potential; photon-induced surface plasmons; plasmon excitation; semiclassical stimulated Raman scattering theory; silver-SiO2-silicon system; Nonlinear optics; Optical pulses; Optical scattering; Phonons; Plasmons; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Computational Electronics (IWCE), 2014 International Workshop on
Conference_Location
Paris
Type
conf
DOI
10.1109/IWCE.2014.6865856
Filename
6865856
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