Title :
State of the art optical materials for lithographic systems for semiconductor manufacturing
Author :
Takke, Ralf ; Kuehn, Bodo ; Thomas, Stephan
Author_Institution :
Div. Opt., Heraeus Quarzglas GmbH & Co. KG, Hanau, Germany
Abstract :
193 nm lithography has enabled semiconductor manufacturing to achieve nm resolution. Highest quality optical materials and optics are an essential part of this. Important optical properties of and test methods for these materials will be reported.
Keywords :
lithography; optical materials; optical testing; semiconductors; lithographic systems; optical materials; semiconductor manufacturing; test methods; wavelength 193 nm; Lithography; Material properties; Optical materials; Optical refraction; Optical variables control;
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2014 Conference on
Conference_Location :
San Jose, CA
