DocumentCode :
1770963
Title :
High mobility metal oxide thin film transistors active-matrix organic light-emitting diode television
Author :
Tsung-Hsiang Shih ; Hung-Che Ting ; Chih-Lei Chen ; Lun Tsai ; Chia-yu Chen ; Li-Fong Lin ; Hong-Shen Lin ; Lee-Hsun Chang ; Yu-Hsin Lin
Author_Institution :
Large Size OLED Technol., AU Optronics Corp., Hsinchu, Taiwan
fYear :
2014
fDate :
2-4 July 2014
Firstpage :
17
Lastpage :
20
Abstract :
We reported large size amorphous Indium-Gallium-Zinc-Oxide and Indium-Tin-Zinc-Oxide thin film transistors active-matrix organic light-emitting diode television development history in AUO. The Gen6 threshold voltage uniformity can lower than 1.0V. Amorphous Indium-Tin-Zinc-Oxide thin film transistors show a higher mobility of 33.2 cm2/VS. Amorphous 56 inches back channel etch type Indium-Tin-Zinc-Oxide active-matrix organic light-emitting diode television is 1st time revealed. Metal-organic chemical vapor deposition system is used to evaluate the new high mobility material. The side-by-side organic light-emitting diode device is realized by fine metal mask. The dam and fill encapsulation method shows a simple process procedure and highly stability. Ink jet printing is adopted to produce a small size full color panel. By the application of compensation pixel circuit, the panel drove by AUO engine shows an excellent characteristic.
Keywords :
MOCVD; amorphous semiconductors; gallium compounds; indium compounds; ink jet printing; organic light emitting diodes; television; thin film transistors; tin compounds; zinc compounds; Gen6 threshold voltage uniformity; InGaZnO; InSnZnO; active-matrix organic light-emitting diode television; amorphous indium-gallium-zinc-oxide thin film transistors; amorphous indium-tin-zinc-oxide thin film transistors; compensation pixel circuit; dam and fill encapsulation method; fine metal mask; high mobility material; high mobility metal oxide thin film transistors; ink jet printing; metal-organic chemical vapor deposition; side-by-side organic light-emitting diode; size 56 inch; Active matrix organic light emitting diodes; Image color analysis; Plasmas; Stress; TV; Thin film transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Active-Matrix Flatpanel Displays and Devices (AM-FPD), 2014 21st International Workshop on
Conference_Location :
Kyoto
Type :
conf
DOI :
10.1109/AM-FPD.2014.6867110
Filename :
6867110
Link To Document :
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