• DocumentCode
    1770982
  • Title

    Mist deposition technology as a green route for thin film growth

  • Author

    Fujita, S.

  • Author_Institution
    Photonics & Electron. Sci. & Eng. Center, Kyoto Univ., Kyoto, Japan
  • fYear
    2014
  • fDate
    2-4 July 2014
  • Firstpage
    53
  • Lastpage
    56
  • Abstract
    The advancement of mist deposition technology, which is a safe, simple, cost-effective, and low-energy-consumption non-vacuum thin film fabrication technology, is reviewed from the basic concepts to the most up-to-date achievements. Successful applications to a variety of films have emphasized the advantages of this technology as allowing an open-air continuous process, such as a roll-to-roll process, for the effective fabrication of large-area devices.
  • Keywords
    chemical vapour deposition; thin films; green route; low-energy-consumption non-vacuum thin fabrication; mist deposition technology; thin film growth; Chemical elements; Chemicals; Conductivity; Fabrication; Films; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Active-Matrix Flatpanel Displays and Devices (AM-FPD), 2014 21st International Workshop on
  • Conference_Location
    Kyoto
  • Type

    conf

  • DOI
    10.1109/AM-FPD.2014.6867120
  • Filename
    6867120