DocumentCode :
1770982
Title :
Mist deposition technology as a green route for thin film growth
Author :
Fujita, S.
Author_Institution :
Photonics & Electron. Sci. & Eng. Center, Kyoto Univ., Kyoto, Japan
fYear :
2014
fDate :
2-4 July 2014
Firstpage :
53
Lastpage :
56
Abstract :
The advancement of mist deposition technology, which is a safe, simple, cost-effective, and low-energy-consumption non-vacuum thin film fabrication technology, is reviewed from the basic concepts to the most up-to-date achievements. Successful applications to a variety of films have emphasized the advantages of this technology as allowing an open-air continuous process, such as a roll-to-roll process, for the effective fabrication of large-area devices.
Keywords :
chemical vapour deposition; thin films; green route; low-energy-consumption non-vacuum thin fabrication; mist deposition technology; thin film growth; Chemical elements; Chemicals; Conductivity; Fabrication; Films; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Active-Matrix Flatpanel Displays and Devices (AM-FPD), 2014 21st International Workshop on
Conference_Location :
Kyoto
Type :
conf
DOI :
10.1109/AM-FPD.2014.6867120
Filename :
6867120
Link To Document :
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