DocumentCode :
1771232
Title :
Comparison of VO2 thin films deposited by pulsed laser, electron-beam and sputter deposition
Author :
Marvel, R.E. ; Harl, R.R. ; Rogers, B.R. ; Haglund, R.F.
Author_Institution :
Phys. Dept., Vanderbilt Univ., Vanderbilt, TN, USA
fYear :
2014
fDate :
8-13 June 2014
Firstpage :
1
Lastpage :
2
Abstract :
The optical performance and morphology of VO2 thins films deposited by electron beam evaporation, rf magnetron sputtering and pulsed laser deposition are compared. Laser-deposited films are strongly affected by substrate dewetting and epitaxial mismatch.
Keywords :
electron beam deposition; epitaxial growth; epitaxial layers; pulsed laser deposition; sputter deposition; vanadium compounds; VO2; electron beam evaporation; electron-beam deposition; epitaxial mismatch; morphological property; optical performance; pulsed laser deposition; rf magnetron sputtering; sputter deposition; substrate dewetting; thin film deposition; Annealing; Optical films; Optical imaging; Sputtering; Substrates; Ultrafast optics;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2014 Conference on
Conference_Location :
San Jose, CA
Type :
conf
Filename :
6989331
Link To Document :
بازگشت