Structure and Energy Deposition Process of an Inductively Coupled Plasma Under Confronting Divergent Magnetic Fields

Author

Minami, Yasuo ; Asami, Yusuke ; Sugawara, H.

Author_Institution

Grad. Sch. of Inf. Sci. & Technol., Hokkaido Univ., Sapporo, Japan

Volume

42

Issue

10

fYear

2014

fDate

Oct. 2014

Firstpage

2550

Lastpage

2551

Abstract

We simulated electron motion in confronting divergent magnetic fields (CDMFs) using a Monte Carlo method. Fundamental plasma structure under a filtering effect of the separatrix of CDMFs was depicted. Hot spots of energy deposition into electrons were observed not only near the RF antenna but also near the equistrength surface of 2B_ECR, where B_ECR is the RF-resonant magnetic field strength.

Keywords

Monte Carlo methods; antennas in plasma; plasma simulation; Monte Carlo method; RF antenna; RF-resonant magnetic field strength; divergent magnetic fields; electron motion; energy deposition; energy deposition process; inductively coupled plasma; plasma structure; separatrix filtering effect; Discharges (electric); Fault diagnosis; Magnetic resonance; Magnetic separation; Monte Carlo methods; Plasmas; Radio frequency; (X) -point plasma; Cusp magnetic field; Monte Carlo method; X-point plasma; filtering effect; separatrix;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2014.2343275

Filename

6873320