• DocumentCode
    1771614
  • Title

    Dispersion engineering of silicon microdisk resonators by thermal oxidation

  • Author

    Jiang, Wei C. ; Usechak, Nicholas G. ; Qiang Lin

  • Author_Institution
    Inst. of Opt., Univ. of Rochester, Rochester, NY, USA
  • fYear
    2014
  • fDate
    8-13 June 2014
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We demonstrate a convenient approach for precise dispersion engineering of silicon microdisk resonators via thermal oxidation. This technique potentially enables efficient correlated photon-pair generation for quantum photonics.
  • Keywords
    elemental semiconductors; micro-optics; microcavities; optical fabrication; optical resonators; oxidation; quantum optics; silicon; Si; efficient correlated photon-pair generation; precise dispersion engineering; quantum photonics; silicon microdisk resonators; thermal oxidation; Dispersion; Optical device fabrication; Optical imaging; Optical resonators; Oxidation; Photonics; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2014 Conference on
  • Conference_Location
    San Jose, CA
  • Type

    conf

  • Filename
    6989522