DocumentCode :
1772897
Title :
Modeling and analysis of cracked through silicon via (TSV) interconnections
Author :
Gerakis, Vasileios ; Avdikou, Christina ; Liolios, Alexandros ; Hatzopoulos, Alkis
Author_Institution :
Dept. of Electr. & Comput. Eng., Aristotle Univ. of Thessaloniki, Thessaloniki, Greece
fYear :
2014
fDate :
23-25 April 2014
Firstpage :
310
Lastpage :
313
Abstract :
A lumped analytical electrical model for cracked (open fault) TSVs is proposed in this paper. Accurate and reliable fault models can support the test methods for the possible defects and they can be vital to improve the quality of TSV-based 3D-ICs. The model is verified by simulations using a commercial 3D resistance, capacitance and inductance extraction tool. The presented simulation results are in close agreement with the proposed analytical expressions.
Keywords :
cracks; integrated circuit interconnections; integrated circuit modelling; three-dimensional integrated circuits; TSV-based 3D-IC quality; commercial 3D capacitance extraction tool; commercial 3D inductance extraction tool; commercial 3D resistance extraction tool; cracked TSV interconnection; cracked through silicon via interconnection; fault model; lumped analytical electrical model; Analytical models; Capacitance; Integrated circuit modeling; Mathematical model; Solid modeling; Three-dimensional displays; Through-silicon vias; 3D ICs; TSV; crack; fault modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design and Diagnostics of Electronic Circuits & Systems, 17th International Symposium on
Conference_Location :
Warsaw
Print_ISBN :
978-1-4799-4560-3
Type :
conf
DOI :
10.1109/DDECS.2014.6868817
Filename :
6868817
Link To Document :
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