DocumentCode
1777258
Title
Physical understanding of graphene/metal hetero-contacts to enhance MoS2 field-effect transistors performance
Author
Du, Yun ; Yang, Lei ; Zhang, Juyong ; Liu, Hongying ; Majumdar, K. ; Kirsch, P.D. ; Ye, Peide D.
Author_Institution
Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
fYear
2014
fDate
22-25 June 2014
Firstpage
147
Lastpage
148
Abstract
Semiconducting transition metal dichalcogenide (TMD) is a promising two-dimensional material with a potential for next-generation nanoelectronic applications [1-3]. One of the most studied TMD materials, MoS2, has become an emerging candidate in the field of flexible electronics. In this report, a monolayer graphene is sandwiched between the metal contact and the few-layer n-type MoS2 film to form hetero-contacts, which enhances the electronic coupling between metal and MoS2 and boost the electron injection into MoS2, leading to a significant contact resistance reduction [4,5]. Over 70 devices are studied to obtain a comprehensive description of electrical performance on hetero-contacts devices. We further apply the transfer length method (TLM) on graphene/metal hetero-contacts devices to accurately extract the contact resistance and compare the results with direct metal contact devices. For both Ti and Pd metal contacts, 3.3 times and 4.5 times reduction in contact resistance from hetero-contacts have been achieved, respectively. Moreover, we study the band alignment of graphene/metal hetero-contacts on MoS2 to provide physical insights into the contact resistance reduction using graphene.
Keywords
contact resistance; electrical contacts; field effect transistors; flexible electronics; graphene; monolayers; C-MoS2; TLM; TMD material; contact resistance reduction; electron injection; electronic coupling enhancement; few-layer n-type film; field-effect transistor; flexible electronics; graphene-metal heterocontac; monolayer graphene; next-generation nanoelectronic application; semiconducting transition metal dichalcogenide; transfer length method; Contact resistance; Graphene; Materials; Metals; Performance evaluation; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference (DRC), 2014 72nd Annual
Conference_Location
Santa Barbara, CA
Print_ISBN
978-1-4799-5405-6
Type
conf
DOI
10.1109/DRC.2014.6872340
Filename
6872340
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